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A New Approach to Reticle Haze Defect Management in the FabGAU, Yeu-Dong; HSIAO, Kevin; HSU, Wen-Hao et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73791H.1-73791H.7Conference Paper

Analog set-up for non linear dielectric measurements up to 100 kHzLEBLOND, J.-M; DOUALI, R; LEGRAND, C et al.EPJ. Applied physics (Print). 2008, Vol 44, Num 2, pp 205-209, issn 1286-0042, 5 p.Article

CALCULATION OF 3D CAPACITANCES OF WIRES WITH HYBRID MOM/MAS APPROACHKARKASHADZE, D; JOBAVA, R; FREI, S et al.International Seminar/Workshop on Direct and Inverse Problems of Electromagnetic and Acoustic Wave Theory. 2004, pp 61-64, isbn 966-023253-5, 1Vol, 4 p.Conference Paper

Implementing MEMS resonators in 90 nm CMOSRAMSTAD, J. E; MICHAELSEN, J. A; SOERAASEN, O et al.Symposium on design, test, integration and packaging of MEMS-MOEMS. 2011, pp 116-121, isbn 978-2-355-00013-3, 1Vol, 6 p.Conference Paper

Characterization of EUV optics contamination due to photoresist related outgassingPOLLENTIER, I; GOETHALS, A.-M; GRONHEID, R et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7636, issn 0277-786X, isbn 978-0-8194-8050-7 0-8194-8050-9, 76361W.1-76361W.10, 2Conference Paper

Wide frequency range analysis of the electromagnetic emissions of electrical machine for diagnosisROMARY, R; ROGER, D; BRUDNY, J. F et al.EPJ. Applied physics (Print). 2008, Vol 43, Num 2, pp 165-172, issn 1286-0042, 8 p.Article

Impedance spectroscopy as a tool for chemical and electrochemical analysis of mixed conductors : A case study of ceriaWEI LAI; HAILE, Sossina M.Journal of the American Ceramic Society. 2005, Vol 88, Num 11, pp 2979-2997, issn 0002-7820, 19 p.Article

Actinic phase defect detection and printability analysis for patterned EUVL maskTERASAWA, Tsuneo; YAMANE, Takeshi; TANAKA, Toshihiko et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7636, issn 0277-786X, isbn 978-0-8194-8050-7 0-8194-8050-9, 763602.1-763602.10, 2Conference Paper

EM Calibration based on Post OPC Layout AnalysisSREEDHAR, Aswin; KUNDU, Sandip.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7641, issn 0277-786X, isbn 978-0-8194-8055-2 0-8194-8055-X, 764113.1-764113.12Conference Paper

Improvement of EUV-Mask defect printability evaluationTAKAGI, Noriaki; SHIGEMURA, Hiroyuki; AMANO, Tsuyoshi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7636, issn 0277-786X, isbn 978-0-8194-8050-7 0-8194-8050-9, 763621.1-763621.9, 2Conference Paper

Actinic EUVL mask blank inspection and phase defect characterizationYAMANE, Takeshi; IWASAKI, Teruo; TANAKA, Toshihiko et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73790H.1-73790H.7Conference Paper

An Open-Architecture approach to Defect Analysis Software for Mask Inspection SystemsPEREIRA, Mark; PAI, Ravi R; MOHAN REDDY, Murali et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 737927.1-737927.8Conference Paper

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Pulsed lasers in photovoltaic technologyBARHDADI, A; HARTITI, B.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8011, issn 0277-786X, isbn 978-0-8194-8585-4, 801120.1-801120.10, 4Conference Paper

Absorber stack optimization in EUVL masks: lithographic performances in alpha demo tool and other issuesSEO, Hwan-Seok; LEE, Dong-Gun; AHN, Byung-Sup et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7636, issn 0277-786X, isbn 978-0-8194-8050-7 0-8194-8050-9, 76360X.1-76360X.9, 2Conference Paper

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Mesure des composants électroniques Partie 3: mesure des composants actifsPOULICHET, Patrick; AMENDOLA, Gilles; DELABIE, Christophe et al.Techniques de l'ingénieur. Mesures et contrôle. 2009, Vol RE2, Num R1080v2, issn 0399-4147, R1080v2.1-R1080v2.26Article

Advances in Post AFM Repair Cleaning of Photomask with CO₂ Cryogenic Aerosol TechnologyBOWERS, Charles; VARGHESE, Ivin; BALOOCH, Mehdi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73791I.1-7379I.8Conference Paper

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The study of defect detection method for 32nm technology node and beyondSEKI, Kazunori; SHIBITA, Masafumi; AKIMA, Shinji et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 737928.1-737928.12Conference Paper

Impact of EUV mask absorber defect with pattern-roughness on lithographic imagesKAMO, Takashi; AOYAMA, Hajime; ARISAWA, Yukiyasu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7636, issn 0277-786X, isbn 978-0-8194-8050-7 0-8194-8050-9, 76360L.1-76360L.12, 2Conference Paper

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